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| Model NO. | CY-ALD | Type | Coating Production Line |
| Coating | Vacuum Coating | Certification | CE |
| Condition | New | Wafer Dimension | 8 Inch and Below |
| Wafer Temperature | Rt-400c, Precision +-0.1c | Precursor Lines | 3 Lines (Optional More) |
| Vacuum Level | <5*10-3torr | Gas Carrier | N2 or Ar |
The Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale industrialization experiments. Fully compliant with CE standards, it is widely utilized in micro-electronics, nano-materials, optical films, and solar battery technology.
| Parameter | Specification Details |
|---|---|
| Wafer Temperature | RT-400ºC, Controlling precision ±0.1ºC |
| Precursor Line Temp | RT-200ºC, Controlling precision ±0.1ºC |
| Source Bottle Temp | RT-200ºC, Controlling precision ±0.1ºC |
| ALD Valve | Swagelok ALD swift valve |
| Growing Mode | Consecutive or interval deposition mode |
| Power Supply | 50-60Hz, 220V/20A AC |
| Instrument Dimension | 600mm x 600mm x 1100mm |
