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Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
The equipment features a reasonable structure, providing uniform coating with high quality. It boasts rapid pumping speeds, short cycles, high efficiency, and easy operation. With low energy consumption and stable performance, it is widely utilized across various industries including automotive, audio, small appliances, computers, watches, toys, mobile phones, reflective cups, and cosmetics.
The DC magnetron sputtering coating machine is typically employed for direct sputtering coating on various substrates such as plastics, glass, metal, and ceramics. Magnetic fields define the behavior and properties of ion-charged particles used for sputtering. Modelling of magnetron sputtering enhances productivity, applicability, and reproducibility.
| Model Number | SP-1000 | SP-1200 | SP-1400 | SP-1800 |
|---|---|---|---|---|
| Dimension of vacuum chamber (dia*height) | 1000*1100 | 1200*1400 | 1400*1600 | 1800*2000 |
| Material of vacuum chamber | Carbon steel, SUS304 or SUS316L | |||
| Quantity of sputtering cathodes | ≥1 sets, DC sputtering system, cylindrical or rectangle cathodes | |||
| Pumping system | Turbo molecular pumps or diffusion pump + mechanical pump | |||
| Pumping Time | From atmosphere to 5.0*10-2Pa less than 8 minutes | |||
| Ultimate Vacuum | 5.0*10-4 Pa | |||
| Total Power | 40-100kW | 70-1000kW | ||
* All specifications can be customized according to specific requests.
Essential parts available for daily production requirements:
