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Magnetron Sputtering Coater introduction:
Three targets RF magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment. It is standardized, modular and customizable. There are 1-inch or 2-inch magnetron targets for you to choose. Customers can choose the target according to the size of the substrate to be coated. The device is equipped with three 300W RF power supply. The RF power supply can be used for the preparation of non-metal. The three targets can meet the needs of multi-layer or multiple coatings.
The coating machine is equipped with two-channel high-precision mass flowmeter. The instrument is equipped with advanced turbomolecular pump sets, the ultimate vacuum is up to 1.0E-5Pa. Molecular pump gas path is controlled by multiple solenoid valves, you can open the chamber to take out the sample without shutting down the pump, greatly improving work efficiency.
| Sample stage | Size | φ185mm | Control Accuracy | ±1ºC |
| Heating Temp | Max 500ºC | Rotate Speed | 1-20rpm adjustable | |
| Sputtering Head | Quantity | 2"×3 (1",2" optional) | Water chiller | Flow rate of 10L/min |
| Cooling mode | Water cooling | - | - | |
| Vacuum Chamber | Chamber size | φ300mm×300mm | Watch window | φ100mm |
| Material | Stainless steel | Opening mode | Top cover open | |
| Mass flowmeter | 2 channels; measuring range 100sccm (customizable) | |||
| Vacuum system | Ultimate vacuum | 1.0E-5Pa | Molecular pump | CY-600 |
| Backing pump | Rotary vane pump | Measurement | Compound vacuum gauge | |
| Pumping rate | Vacuum up to 1.0E-3Pa in 20 minutes | |||
| Power config | Quantity | RF power supply×3 | Max output | RF 300 W |
